2D Materials Solutions

The Nanofab delivers high performance growth of nanomaterials with in-situ catalyst activation and rigorous process control.

Cold wall design with showerhead based
uniform precursor delivery
Remote plasma via ICP option
Vacuum load lock for quick sample exchange
Excellent temperature uniformity
Optional liquid/solid source delivery system for growth of MoS₂,MoSe₂ and other TMDCs
Variable sample sizes up to maximum 200mm wafers
Multiple view ports for diagnostics

Introducing... FlexAL 2D! ALD processing for 2D materials

ALD of 2D transition metal dichalcogenides for nanodevice applications
H₂S plasma & H₂S gas dosing
Growth on 200mm wafers
Growth of ALD dielectrics & other ALD layers on 2D materials in one tool
High temperature table (up to 600°C)
RF substrate biasing option for process flexibility
In situ process monitoring option using spectroscopic ellipsometry & mass spectrometry

FREE Webinar

Atomic Layer Deposition for 2D materials and devices

Knowledge base

2D Materials Webinar Atomic Scale Processing Webinar Paper: Improved process for 2D MoS2 fabrication

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Deposition Processes Growth Processes Graphene Growth Growth of hBN Growth of MoS2 Growth of 2D MoS2 Graphene heterostructures FlexAL ALD Tool Nanofab