製品

プロダクト・グループ (何も選択されていません)

ALD

Excellent process control
Superb thin film barrier properties
Virtually pin-hole free films

ALE

High selectivity
Low damage
Excellent uniformity

DSiE

Precision etch processes
High selectivity
High aspect ratio

IBD

Multiple wafer handling options
Multiple mode functionality
Single wafer loadlock or cluster wafer handling

IBE

Multiple wafer handling options
Multiple mode functionality
Single wafer loadlock or cluster wafer handling

ICP Etching

High density
Low pressure
Wide temperature range

ICPCVD

Excellent quality
Low damage films
Wide temperature range

Nanoscale Growth

Cold wall design with showerhead
Excellent temperature uniformity
Up to 1200^oC

PECVD

Excellent uniformity
High rate films
Excellent control of film properties

RIE Etching

Anisotropic dry etching
Fast and consistent etching
High pumping capacity

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