Semiconductor failure analysis solutions
This webinar will expand on how Oxford Instruments solutions can enable you to overcome failures and other challenges.
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This webinar will expand on how Oxford Instruments solutions can enable you to overcome failures and other challenges.
Dr Mark Dineen and Dr Owain Thomas discuss how plasma etching can be use to get the most from your devices with the highest yield. Listen out for the key elements to look for in your plasma process.
This presentation describes the approaches taken to increasing productivity in LED production, by increasing both process rates and by the number of wafers processed simultaneously.
Dr Katie Hore and Stephanie Baclet will discuss the key elements required to reliably manufacture GaAs/AlGaAs VCSELs
Dr Mark Dineen describes cutting edge technology that offers several process capabilities suited to the SiC via application.
Focuses on recent advances in growth of these materials as well as Raman characterisation & elucidate the interplay between process engineering & materials characterisation.
Dr David Pearson and Joao Ferreira discuss the deposition of laser bar coatings and give a brief introduction of laser technologies and their applications.
Dr Ravi Sundaram and Dr Harm Knoops discuss the processing of atomic scale materials and devices including Graphene and 2D materials, atomic layer etching and atomic layer deposition.
Dr Uwe Schroeder and Dr Harm Knoops will disuss the ALD of ferroelectric HfO2 for novel memory applications and the tuning properties of TiO2 and HfO2 ...
Dr Knoops and Dr Neumaier discuss how ALD can be used to grow various materials such as dielectrics on 2D materials and how it can also be used to directly (or indirectly) grow other materials.
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