Thursday 7 December 2017 - 3:30pm UK time
Dr Mark Dineen and Dr Owain Thomas discuss how plasma etching can be use to get the most from your devices with the highest yield. Listen out for the key elements to look for in your plasma process.
The webinar will comprise of two talks, with a Q&A session at the end.
The plasma processing toolkit for InP laser diode productionFill out the form to download
Dr Mark Dineen, Technical Marketing Manager at Oxford Instruments Plasma Technology.
Dr Dineen has a BSC Hons Physics from University of Liverpool. He holds a PhD on plasma etching of Gallium Nitride. As the market for III-V devices increased, he became more specialised in plasma etch: RIE and RIE-ICP.
Then with the rise of Solid State Lighting, based on GaN and AlInGaP structures, he was able to take a broader view on how both etch and deposition plasma processing techniques are key to improving device performance.
His more recent work includes applying this knowledge to a wide range of devices from semiconductor lasers to GaN based RF devices.
Dr. Owain Thomas is a Deposition applications Specialist at Oxford Instruments, Plasma Technology.
His qualifications include a Bachelors degree in Chemistry (1st) and a PhD in Surface Chemistry from Cardiff University.
Owain Thomas has 17 years experience in semiconductor industry, specialising in Thin film deposition, PECVD, CVD. He is an expert in Plasma Deposition and growth techniques.
His work covers developing and improving plasma CVD processes and applications for Oxford Instruments and its customers.