オックスフォード・インストゥルメンツー事業部ページ
拡張

Tungsten Silicide 

Tungsten Silicide  (WSi) a compound of Tungsten is used in semiconductor electronics on top of poly Si gates to increase the transistor speed.

It can be etched using Inductively Coupled Plasma (ICP) and Reactive Ion Etching (RIE).

More on ICP Request more information
More on RIE Request more information

Related Products