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Zinc Oxide (ZnO) is a wide bandgap II-VI semicondcutor. It has applications in LEDs and transparent conducting oxides (TCOs).
It can be etched using Inductively Coupled Plasma (ICP) and Reactive Ion Etching (RIE).
ZnO may be deposited using Atomic Layer Deposition (ALD).
Process demonstrates low damage etching with good surface quality and excellent uniformity.
High material quality, tuning of resistivity from semiconductive to conducting by doping and plasma exposures.
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