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Atomic Layer Etching (ALE) Systems

In order to realise true ALE at a reasonable rate fast, accurate control of gas flows and plasma powers are required, the PlasmaPro 100 ALE delivers this through specialised hardware including:

  • Precise control of gas dose using fast acting MFCs
  • Excellent repeatability of low power RF delivery
  • Rapid switching enabled by fast PLC

All these combine to enable etching with accuracy at the atomic scale

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